Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering

Indentation Response and Contact Damage of Hard T-B-N Films Deposited by Magnetron Sputtering

Blog Article

Titanium-boron-nitride (Ti-B-N) films were deposited by reactive magnetron sputtering using a single TiB2 target.The films were deposited under different Boys Pants Ar:N2 ratios.The instrumented indentation technique (nanoindentation), is used to evaluate the mechanical properties of the films.

A methodology Computer Racks is presented to evaluate the critical load to failure directly from the load depth curves.Significant effect of Ar:N2 ratio was observed on the mechanical properties of the Ti-B-N films.